Micro/Nano Fabrication and Cleanroom
The MRL Micro/Nanofabrication Facility is a multidisciplinary, user-supported facility providing equipment and resources for thin film deposition and the fabrication of patterned micro-and nano-sized structures on flexible and other multi-layer electronic devices.The facility operates a 1,400 square foot, class-100 cleanroom with instrumentation for wet/chemical etching, spin coating, mask aligners, and general optical and 3D printing lithography. The facilities also include an on-site mask fabrication service and an additional 500 square foot class-100 cleanroom with an electron-beam lithography system capable of 20-nm line resolution for pattern delineation and device fabrication.
Cleanroom
The MicroFab cleanroom is used for a wide range of micro and nano-fabrication projects. In addition to UIUC researchers, the cleanroom allows outside academic users as well as users from industry. Learn more about the MRL Cleanroom >>
Techniques
Deposition Tools
The facilities include a variety of tools for thin-film and multi-layered structure fabrication using electron-beam and thermal evaporators, sputtering and atomic layer deposition methods. We provide the deposition sources and targets but in many cases users can work with staff to add their sources for their own, specific materials.Diffusion / Annealing Furnaces
Several furnaces covering a variety of temperature ranges under vacuum or various ambient conditions are available to carry out diffusion processes, dopant activation, ion-implantation damage repair, fabrication of graphene or carbon nanotubes, etc.Dry Etching
Dry etching is a key step in device fabrication where layers or selected areas of material are removed by employing a plasma of reactive gases. The MRL offers several dry etching tools applicable to a variety of layers and substrate types and sizes.Lithography
Lithography uses light or electron beam to produce specific patterns on substrates during device fabrication. Photo- and electron-beam lithography facilities are available in the MRL through a series of mask aligners, stampers, ovens, two-photon sub-micron lithography 3D printing and an electron-beam lithography system.Wet Processing
Wet processing work in the MRL Cleanroom is supported by several fume hoods and flow benches for processes involving acids, solvent developer, and metal etchants.Equipment in this Core
Equipment Name | Contact | Location | Technique(s) |
---|---|---|---|
4155c Semiconductor Parameter Analyzer (Agilent), used with Lake Shore and custom probe station | frao@illinois.edu | 326 MRL | Probe Stations |
6" Tube oxidation furnace | frao@illinois.edu | 328 MRL | Diffusion / Annealing Furnaces |
Acid Fume Hood | xlwang84@illinois.edu | 359 MRL | Wet Processing |
AJA ATC2000 Sputter Coater 1 | taoshang@illinois.edu | 336 MRL | Deposition Tools |
AJA E-beam evaporator 1 | taoshang@illinois.edu | 348 MRL | Deposition Tools |
AJA Orion 3 Sputter Coater 2 | taoshang@illinois.edu | 326 MRL | Deposition Tools |
AJA Orion-8 Magnetron Sputtering System | frao@illinois.edu | 336 MRL | Deposition Tools |
AJA Orion-8 Sputtering System for Magnetic Materials | frao@illinois.edu | 336 MRL | Deposition Tools |
Ball Bonder (25 um Gold wire, K&S 4524A) | frao@illinois.edu | 326 MRL | Bonding Stations |
Bench Top Probe Station (Custom) | frao@illinois.edu | 326 MRL | Probe Stations |
Commonwealth Scientific Ion Milling & Thermal Evaporator System | frao@illinois.edu | 334 MRL | Dry Etching |
Heidelberg MLA150 aligner for maskless photolithography | jeffg@illinois.edu | 388 MRL | Lithography |
High Temperature CM furnace – max temperature 1600°C | frao@illinois.edu | 328 MRL | Diffusion / Annealing Furnaces |
Jandel 4-Point Probe Sheet Resistance Measurement | frao@illinois.edu | 326 MRL | Additional Micro/Nanofabrication Resources |
Kurt J. Lesker Nano36 Thermal Evaporator System | xlwang84@illinois.edu | 326 MRL | Deposition Tools |
Lindberg 2" Tube oxidation/annealing furnace | frao@illinois.edu | 328 MRL | Diffusion / Annealing Furnaces |
Metal Etchant Fume Hood | xlwang84@illinois.edu | 387 MRL | Wet Processing |
MJB3 Mask Aligner | jeffg@illinois.edu | 313 MRL | Lithography |
MJB4 Mask Aligner | jeffg@illinois.edu | 313 MRL | Lithography |
Nano-Master Reactive Ion Etch (RIE) Plasma System | xlwang84@illinois.edu | 342 MRL | Dry Etching |
Nanoscribe Photonic Professional GT 3D Printer | jeffg@illinois.edu | 335 MRL | Lithography |
Nordson March Reactive Ion Etch (RIE) Plasma System 1 & 2 | xlwang84@illinois.edu | 342 MRL | Dry Etching |
Optical Microscopes with CCD cameras | frao@illinois.edu | 326 MRL | Additional Micro/Nanofabrication Resources |
Plasma-Therm 790 MF Reactive Ion Etch (RIE) Plasma System | xlwang84@illinois.edu | 342 MRL | Dry Etching |
Plasma-Therm Plasma Enhanced Chemical Vapor Deposition System (PECVD) | xlwang84@illinois.edu | 342 MRL | Deposition Tools |
Raith eLine electron Beam Lithography System | taoshang@illinois.edu | 364 MRL | Lithography |
Rapid Thermal Annealing furnace (Custom) – max temperature 1000°C | frao@illinois.edu | 328 MRL | Diffusion / Annealing Furnaces |
Savannah S100 Atomic Layer Deposition Cambridge Nanotech | frao@illinois.edu | 326 MRL | Deposition Tools |
SCS Labcoter2 Parylene Coater | frao@illinois.edu | Deposition Tools | |
Solvent Fume Hood or Developer Fume Hood | xlwang84@illinois.edu | 384 MRL | Wet Processing |
Spin Coater Systems (Headway Research) | jeffg@illinois.edu | 313 MRL | Lithography |
Temescal Ebeam Evaporator 2 | taoshang@illinois.edu | MRL 348 | Deposition Tools |
Temescal Ebeam Evaporator 4 | taoshang@illinois.edu | MRL 348 | Deposition Tools |
Temperature-Controlled Cryogenic Vacuum Probe Station | frao@illinois.edu | 326 MRL | Probe Stations |
UV 365 nm Exposure System (Oriel) | jeffg@illinois.edu | 313 MRL | Lithography |
Wedge Bonder (25 um Aluminum wire, K&S 4523A) | frao@illinois.edu | 326 MRL | Bonding Stations |
Westbond 4KE wire bonder | frao@illinois.edu | 326 MRL | Bonding Stations |
Yield Engineering HMDS Vapor Prime Oven | jeffg@illinois.edu | 313 MRL | Lithography |
Yield Engineering P-I Curing Ovens | jeffg@illinois.edu | 313 MRL | Lithography |