The Grainger College of Engineering
Materials Research Laboratory

Facilities News

TEMPORARY TOOLS/LAB CLOSURES DURING THE MRL PLUMBING REPAIR PROJECT:

Updated 7/21/2025:

 

6/4-7/15 (vent/pipes stack 18):

  • MRL B59 (EM prep, PECs, glovebox, ion mills, bio service prep): NOW OPEN, all tools in this room NOW AVAILABLE.
  • MRL B67 (utilities room): CLOSED 5/12-7/15.
  • MRL 359 (cleanroom acid etching room): NOW OPEN

7/3-7/28 (vent/pipes stack 19):

  • MRL B80: CLOSED for ceiling repair, therefore Dektak stylus profilometer NOT AVAILABLE. Keyence 3D profiler moved to SC0022 and AVAILABLE.
  • MRL 380 (shared staff office): CLOSED.

 

7/19-8/14 (vent/pipes stack 20):

  • MRL 313 (cleanroom gowning area - please see alternative arrangements described below) CLOSED.

 

 

UPCOMING TEMPORARY CLOSURES IN THE MRL FAB CLEANROOM:

The ongoing plumbing and venting pipe replacement project in the MRL building will impact cleanroom access  Room closures and alternative arrangements are outlined below:

MRL 313 (cleanroom gowning room) will be closed from July 18th to August 18th for a plumbing and venting pipe replacement project.

MRL 313 is currently closed and prepared for the ongoing project. For your safety, please avoid entering MRL 313 until further notice.

Below are the alternative arrangements:

-Accessing the Cleanroom

  • MRL 381 (cleanroom hallway entrance) will serve as a temporary gowning lab during the MRL 313 closure.
  • Access: Betsy has added MRL 381C access to users' i-cards. Please verify that you can enter the cleanroom through MRL 381C (between Labs 337 and 335). If you encounter any issues, email Betsy at betsy1@illinois.edu.

-Logging In/Out

  • A laptop is provided in Lab MRL 381 for logging in and out of the cleanroom. Please remember to log in when entering and log out before leaving.

-Supplies

  • Blue shoe covers, bouffant caps, face masks, and gloves (S, M, L, and XL) are available on the shelf near the entrance of MRL 381.

-Cleanroom Gown Storage

Due to limited space in MRL 381, gown storage will not be provided there during the closure. Two options are available:

  • Shared Lockers: Lockers opposite Lab 313 are available for shared use (3-4 users per locker). Users who reserved a hanger before July 17, 2025, have been assigned a locker. Details can be found in the following document:

https://acrobat.adobe.com/id/urn:aaid:sc:US:365ade34-fe8b-48e6-bf2f-05c0ff3adf20?viewer%21megaVerb=group-discover

To reserve a locker later, please email me at xlwang84@illinois.edu. Due to limited availability, we cannot guarantee a locker for every user.

  • Personal Storage: Alternatively, staff will provide ziplock bags for personal storage, which you can keep with you during cleanroom work.

 

We apologize for the inconvenience, but this project is crucial for our building infrastructure.

Please plan your work accordingly and visit https://mrl.illinois.edu/facilities/research-cores/facilities-news for more information.

If you have questions, don't hesitate to contact us.

Thank you for your understanding and support of the MRL shared facilities.

 

 

RESEARCH FACILITIES NEWS:

 

UPCOMING TOOL FOR THE MRL RESEARCH FACILITIES:

Kurt J. Lesker 150LX Plasma Enhanced Atomic Layer Deposition System

The Kurt J. Lesker Company (KJLC) ALD150LX is an Atomic Layer Deposition (ALD) system designed specifically for advanced research and development (R&D) applications. With an emphasis on enabling and supporting innovative, cutting-edge technology at the R&D level, the ALD150LX serves not only as a stand-alone platform, but provides connectivity with additional process and analysis modules in a cluster tool configuration.  ALD150LX cluster tool connectivity eliminates unwanted atmosphere exposure between critical process and analysis steps to protect sensitive surfaces, layers and their interfaces. This connectivity includes the integration of additional ALD and analysis modules, as well as other KJLC thin film deposition technologies for multi-technique process and analysis capability and support that are second-to-none in the industry. Combined quality, flexibility and performance, as well as multi-technique process and analysis capability make the ALD150LX an innovative, best-in-class design.

Features:

  • Process wafers up to 6-inch in diameter.
  • Controllable independent substrate heater stage (up to 600oC)
  • Unique Perpendicular Flow Reactor
  • Thermal or plasma-enhanced ALD configuration
  • In-situ ellipsometry for real time thin film thickness monitoring
  • Multiple inlets for precursor delivery (up to 12 precursor sources)
  • Unique heater design on source modules 
  • control software

Typical Processes:

Al2O3, TiO2, SiO2, Ta2O5, HfO2, ZrO2, HZO, ZnO, AZO, AIN, TiN, GaN Pt and Ru (many others available, please inquire).

Expected fall 2025. Micro/NanoFab Core, MRL. Installation to start on August 26, 2025.