UV/Ozone Cleaner

Ultraviolet (UV) ozone cleaners have proven highly effective in non-acidic, dry, and non-destructive atomic cleaning processes. They efficiently eradicate organic contaminants by utilizing intense UV light at 185 nm and 254 nm. The 185 nm wavelength generates ozone in the presence of oxygen, while the 254 nm wavelength activates organic molecules on surfaces. This dual mechanism swiftly destroys and eliminates organic contaminations. 
UV ozone cleaners are versatile tools capable of cleaning contaminants from a wide range of substrates, including Si, GaAs, quartz, sapphire, glass, mica, ceramics, metals, and various other materials. They are utilized for tasks such as removing and stripping the photoresist, enhancing surface hydrophilicity, cleaning AFM probes/tips, cleansing SEM & TEM samples, polymer activation using UV, assembly/bonding of PDMS/glass microfluidic devices, and cleaning glass, among others. This type of substrate cleaning is particularly valuable prior to thin film deposition, ensuring excellent adhesion of thin films to surfaces. 
At MRL cleanroom, our BHK Inc. lamps are constructed using premium materials such as fused silica, focusing on maximizing output at 185 nm from a grid-shaped low-pressure Hg lamp. Our tool can achieve a maximum intensity of 0.8 mW/cm2 at a distance of 3 inches for a wavelength of 254 nm. Therefore, users should ensure their materials meet the intensity specifications before using the tool.  
UV Ozone Cleaner or O2 plasma cleaner? When deciding between a UV ozone cleaner and an O2 plasma cleaner for semiconductor applications, the choice depends on specific needs. The UV ozone cleaner is preferable if gentle treatment and minimal substrate damage are paramount. However, if aggressive cleaning or etching is necessary, or if a wider range of contaminants must be addressed, the O2 plasma cleaner may be the better choice. The best cleaner is ultimately determined by factors such as the materials being processed, the types of contaminants present, and the desired surface properties. 

The UV Ozone system available inside the cleanroom of MRL