Ellipsometry
Ellipsometry is an optical method used for the characterization of surfaces and thin film layers by measuring the change in polarization of light reflected or transmitted from them. Commonly used to determine layer thickness and optical constants, in some cases ellipsometry can also be applied to determine composition, crystallinity, roughness, and other material properties associated with changes in optical response.
Ellipsometry Equipment
| Equipment Name | Contact | Location | |
|---|---|---|---|
| Equipment Name | Contact | Location | |
| J.A. Woollam VASE |
|
148 MRL |
For spectroscopic ellipsometry. - Measure optical constants and thickness of multilayers or bulk materials, as well as reflectance and transmission as a function of angle of incidence, polarization, and wavelength. - Wavelength range: 240 nm to 1700 nm; - Angle of incidence: 12° to 90°; Temperature: 10 K to 700 K |
| Gaertner L116C |
|
148 MRL |
For single wavelength, multiple angle ellipsometry. |