AJA E-beam evaporator 1

AJA E-beam evaporator 1 has an electron beam gun assembly with six source crucibles. Oxide deposition such as SiO2 can be performed in this tool. The maximum thickness of a single layer is limited to 200 nm and the substrates are kept at room temperature during deposition. One eight inch sample holder which is loaded through load lock chamber is used for line-of-sight deposition. Maximum wafer size in our e-beam deposition systems is currently 4 inches. Deposition rate and thickness of material are monitored and controlled by a crystal thickness monitor.