MRL Photomask Fabrication Facility

MRL Photomask Fabrication Facility

 

The Materials Research Laboratory (MRL) cleanroom offers precision photomask fabrication services to both academic and industrial users. These masks are optimized for use in contact photolithography systems, such as the EVG 6200 TB and Karl Suss MJB4, as well as other mask aligners.

We support the fabrication of both bright-field and dark-field photomasks:

  • Bright-field photomask: A type of mask where the background (field) is transparent, and the features to be patterned are opaque (chrome). It is commonly used for the etching process using positive-tone photoresists.
  • Dark-field photomask: A mask in which the background is opaque, and the features to be patterned are transparent. It is typically used for the lift-off process using positive-tone photoresists.

Below are examples of both types fabricated at MRL:

             

                    

                                            Bright-field photomask                                                       

 

Dark-field photomask          

 

Photomask Fabrication Policy:

  • To request a photomask, please contact: photomasks@mrl.illinois.edu
  • One submission = one mask. For multi-layer designs, each layer must be submitted separately.
  • Accepted file formats: GDSII and CIF. For other formats or design-related questions, please consult us before submission.
  • Design assistance is available upon request. Additional time and fees may apply.
  • Minimum feature size: 1 µm
  • Available mask substrates: 3″ to 5″ Chrome on soda-lime glass or fused silica
  • Turnaround time: Turnaround time depends on the queue, staff, and tool availability. We strive to complete the mask within about 3 business days following design approval and payment, but the turnaround time may be longer. Please allow a minimum of 2 business days for shipping once the mask is fabricated.

MRL 2025 Photomask Services Pricing*

Plate type

UIUC

External Academic

Industry

3" x 3" mask (Cr-coated soda lime plate)

$110

$160

$320

4" x 4" mask (Cr-coated fused silica plate)

$260

$300

$470

5"x 5" mask (Cr-coated soda lime plate)

$120

$170

$330

       

(*) our prices include all fees, raw material, and shipping to outside customers

     Photomask Fabrication Online Payments



 

 

 

Lab location:

Room 388 Materials Research Laboratory

Staff Contact:

Primary contact:
Dr. Mrinal Kanti Hota
hotamk@illinois.edu 
Room# MRL 380

Secondary contact:
Dr. Mauro Sardela
sardela@illinois.edu
Room# MRL SC 2014