Nordson March Reactive Ion Etch (RIE) Plasma System 2
March CS-1701 reactive ion etcher is a bench-top system with water cooled RF platen. It is capable of etching photoresist, polymer and graphene.
This system could be operated under manual mode or auto mode.
Features:
- 400W, 13.56 MHz RF Generator with Automatic Matching Network
- Delivers Excellent Process Repeatability.
- Two MFC gas flow channels: O2 and CF4.
- The March RIE 1/2 chamber is configured with a 7”/5” powered electrode to accommodate a wide range of wafer sizes.
Special Notes and Restrictions:
- You must be qualified by staff to use this tool.
- This tool is reserved for the following materials:photoresist, polymer and graphene.Etching of materials other than these requires prior authorization from staff.
- When you are done with your work, always leave the chamber under vacuum. And never leave a dirty chamber for the next user.
Comparison of the RIE systems available in the MRL shared research facilities:
|
RIE system |
Max. RF power (W) |
Allowable pressure range (mTorr) |
Available process gases |
Allowable Materials (*) |
Sample Size (**) |
|
Samco RIE-10NR |
300 |
|
CF4, SF6, O2, Ar |
Substrates (e.g., Si, Glass, etc.), 2D Transition-metal dichalcogenides, dielectrics (metal oxides, nitrides, etc.) |
Diameter < 8 inches, total thickness < 40 mm |
|
March CS-1701 RIE |
400 |
|
CF4, O2 |
Photoresist, polymer, graphene. |
Diameter < 4 inches, total thickness < 10 mm |
|
Plasma-therm 790 MF |
300 |
|
CF4, SF6, CHF3, O2 |
Silicon, silicon dioxide, silicon nitride |
Diameter < 8 inches, total thickness < 10 mm |
|
Nano-master NPC 3000 |
400 |
|
CF4, SF6, O2, Ar |
Photoresist, polymer, graphene, silicon |
Diameter < 8 inches, total thickness < 10 mm |
(*) Discuss with staff before actually using any of those materials and if other materials are needed in the process. This is required for new and existing experienced users.
(**) Etching rate and quality will depend on several factors (type of material, sample thickness, pattern details, masking parameters, etc.). A discussion with staff is important in order to decide tool assignment and feasibility.
Manufacturer's website:
http://www.nordson.com/en/divisions/march/products/plasma-treatment-systems/rie-system
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