Nordson March Reactive Ion Etch (RIE) Plasma System 2

March CS-1701 reactive ion etcher is a bench-top system with water cooled RF platen. It is capable of etching photoresist, polymer and graphene.

This system could be operated under manual mode or auto mode.

 

march RIE
march RIE

 

Features:

  • 400W, 13.56 MHz RF Generator with Automatic Matching Network
  • Delivers Excellent Process Repeatability.
  • Two MFC gas flow channels: O2 and CF4.
  • The March RIE 1/2 chamber is configured with a 7”/5” powered electrode to accommodate a wide range of wafer sizes.

Special Notes and Restrictions:

  • You must be qualified by staff to use this tool.
  • This tool is reserved for the following materials:photoresist, polymer and graphene.Etching of materials other than these requires prior authorization from staff.
  • When you are done with your work, always leave the chamber under vacuum. And never leave a dirty chamber for the next user.

Comparison of the RIE systems available in the MRL shared research facilities:

RIE system

Max. RF power (W)

Allowable pressure range (mTorr)

Available process gases

Allowable Materials (*)

Sample Size (**)

Samco RIE-10NR

300




10 - 750

CF4, SF6, O2, Ar

Substrates (e.g., Si, Glass, etc.), 2D Transition-metal dichalcogenides, dielectrics (metal oxides, nitrides, etc.)

Diameter < 8 inches, total thickness < 40 mm

March CS-1701 RIE

400


50 - 350

CF4, O2

Photoresist, polymer, graphene.

Diameter < 4 inches, total thickness < 10 mm

Plasma-therm 790 MF

300


10 - 100

CF4, SF6, CHF3, O2

Silicon, silicon dioxide, silicon nitride

Diameter < 8 inches, total thickness < 10 mm

Nano-master NPC 3000

400


70 - 200

CF4, SF6, O2, Ar

Photoresist, polymer, graphene, silicon

Diameter < 8 inches, total thickness < 10 mm

 (*) Discuss with staff before actually using any of those materials and if other materials are needed in the process. This is required for new and existing experienced users.

(**) Etching rate and quality will depend on several factors (type of material, sample thickness, pattern details, masking parameters, etc.). A discussion with staff is important in order to decide tool assignment and feasibility.

 

 

 Resources

Manufacturer's website: 
http://www.nordson.com/en/divisions/march/products/plasma-treatment-systems/rie-system

Contact

Senior Research Engineer
Research Scientist