AJA Orion-8 Sputtering System for Magnetic Materials

This equipment was funded through the Illinois MRSEC, NSF Award Number DMR-1720633.

Features:

  • UHV system
  • 8 targets
  • Off-axis deposition option
  • DC and RF generators
  • Full automation for deposition control
  • +/- 2.5% thickness uniformity over 4” wafer
  • Substrate temperature up to 850oC
  • +/- 0.1oC substrate temperature stability
AJA Orion-8 Sputtering System for Magnetic Materials
AJA Orion-8 Sputtering System for Magnetic Materials
Component
Component

 

 

 

Figure of x-ray reflectometry of the AJA Orion-i sputtering system
Figure of x-ray reflectometry of the AJA Orion-i sputtering system

 

Contact

MRL Facilities Postdoctoral Associate
Research Engineer