Acid Fume Hood

MRL provides the following acids for cleanroom users. This fume hood includes DI water, nitrogen gun and hot plate.


  • Hydrochloric Acid (HCl)Hydrofluoric Acid (HF)
  • Buffered Oxide Etch (BOE)
  • Nano-strip (replacment for piranha)
  • Nitric Acid (HNO3)
  • Phosphoric Acid (HP3O4)


Etching of dielectrics:

  • Etching of SiO2in BOE or HF
  • Etching of Si3N4in HP3O4
  • Thin film etching of TiO2, Al2O3and HFO2in HF mixture

Etching of metals:

  • Etching of AL in HNO3and HP3O4 mixture
  • Etching in Ni in HNO3

Surface Cleaning:

  • Nanostrip is used to remove organic residues from sustrates.

NOTE: a separate safety training must be completed before using this fume hood.


Senior Research Engineer