Deposition Tools

The facilities include a variety of tools for thin-film and multi-layered structure fabrication using electron-beam and thermal evaporators, sputtering and atomic layer deposition methods. We provide the deposition sources and targets but in many cases users can work with staff to add their sources for their own, specific materials.

Note: Maximum deposition thickness for all E-beam systems is 300 nm. In Ebeam 3, special depositions with film thickness > 300 nm and < 1 μm may be allowed only when approved by Staff. There might be an additional surcharge in these cases.

Deposition Tools Equipment