A novel nano-positioning stage for electron microscopy co-invented by MRL staff have been awarded an '09 R&D 100 Award.
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A novel nano-positioning stage for electron microscopy, co-invented by FSMRL staff members Eric Olson and Todor Donchev, and FSMRL Central Facilities Director Ivan Petrov, has been awarded a 2009 R&D 100 Award by R&D Magazine. The R&D 100 Awards are selected annually to recognize the most
Nano-positioning stage for electron microscopy.
Nano-positioning stage for electron microscopy.
technologically significant new products or processes. The stage is used to hold and position samples inside electron microscopes with unprecedented stability, position-control accuracy, and range of motion. The invention is a collaboration between physicists, engineers, and designers from Lawrence Berkeley National Laboratory, the University of Illinois at Urbana-Champaign, Attocube Systems, and the FEI Company as part of the DOE-funded Transmission Electron Aberration-corrected Microscope (TEAM) project.