Surface Analysis
MRL’s surface analysis suite provides a variety of instrumentation for surface chemical analysis, ranging from accelerator-based techniques to various spectroscopy, spectrometry, and profilometry tools.
Techniques
Accelerator-based Techniques
Ion particles accelerated to high energy within a few MeV can be used for ion implantation of materials and also for non-destructive analytical techniques involving scattering processes such as Rutherford Backscattering Spectrometry (RBS).Atom Probe Tomography
The Cameca Local Electrode Atom Probe (LEAP) 5000X uses field evaporation of atoms from a needle-shaped specimen to generate three-dimensional (3D) information at near atomic resolution and possessing chemical sensitivity that can reach parts per million.Auger Electron Spectroscopy
Auger electron spectroscopy (AES) is a surface sensitive analytical technique used mainly to determine elemental compositions of materials and, in certain cases to identify the chemical states of surface atoms. With AES, a primary electron beam is used to excite secondary and Auger electrons.Secondary Ion Mass Spectrometry
In secondary ion mass spectrometry (SIMS), a focused ion beam is directed to a solid surface, removing material in the form of neutral and ionized atoms and molecules.Surface Profilometry
Surface profilometry is a contact measurement technique in which a diamond-tipped stylus is used to measure surface topography as it moves across the surface of a specimen.X-Ray Photoelectron Spectroscopy
In X-ray photoelectron spectroscopy (XPS), also called electron spectroscopy for chemical analysis (ESCA), X-rays excite photoelectrons, and the emitted electron signal is plotted as a spectrum of binding energies.Equipment in this Core
| Equipment Name | Contact | Location | Technique(s) |
|---|---|---|---|
| Cameca LEAP 5000X Atom Probe Tomography | tspila@illinois.edu | B01 MRL | Atom Probe Tomography |
| Kratos Axis ULTRA | r-haasch@illinois.edu | B81 MRL | X-Ray Photoelectron Spectroscopy |
| NEC Pelletron Accelerator | tspila@illinois.edu | 130 MRL | Accelerator-based Techniques |
| Physical Electronics 5400 | r-haasch@illinois.edu | B08 MRL | X-Ray Photoelectron Spectroscopy |
| Physical Electronics 660 | r-haasch@illinois.edu | B06 MRL | Auger Electron Spectroscopy |
| Physical Electronics Trift III | tspila@illinois.edu | B04 MRL | Secondary Ion Mass Spectrometry |
| Sloan Dektak3ST | kawalsh@illinois.edu | B80 MRL | Surface Profilometry |