A new Nanoscribe 3D laser lithography system has recently been added to the MRL Central Research Facilities and is now available to the research community.
“We are exceptionally excited to now have a Nanoscribe 3D writer in the MRL facilities,” said MRL Director Paul Braun. “Its ability to 3D print at dimensions down to 100 nanometers will enable new research in areas ranging from optics to mechanics.”
The Nanoscribe has been heralded as the “next generation 3D laser lithography system,” setting new standards in 3D micro-printing and maskless lithography. It combines two writing modes in just one device: one, precise piezo technology for arbitrary 3D trajectories and two, a high-speed 3D printing galvo mode for the fastest structuring in a layer-by-layer fashion.
The first writing mode includes precise piezo technology for arbitrary 3D trajectories. Piezo technology (the word “piezo” being derived from the Greek word for “pressure”) allows for a very precise, trajectory where the substrate is moved in all three dimensions by a high-precision positioning unit relative to the focusing optics.
The second mode is a high-speed 3D printing, in which the laser beam is laterally scanned by galvanometric mirrors, allowing for very fast fabrication speeds, employing a layer-by-layer build process.
Braun continued, “In conjunction with the other tools in the MRL, this will enable the new 3D sculpting of all the major classes of materials — including metals, ceramics, semiconductors, and polymers.”
To reserve this machine for use, visit: https://cmmserv.mrl.illinois.edu/schedule/login.asp
Not a current user? Learn more here: http://mrl.illinois.edu/facilities/becoming-user