Acid Fume Hood

MRL provides the following acids for cleanroom users. This fume hood includes DI water, nitrogen gun and hot plate.

Chemicals

• Hydrochloric Acid (HCl)Hydrofluoric Acid (HF)
• Buffered Oxide Etch (BOE)
• Nano-strip (replacment for piranha)
• Nitric Acid (HNO3)
• Phosphoric Acid (HP3O4)

Processes

Etching of dielectrics:

• Etching of SiO2in BOE or HF
• Etching of Si3N4in HP3O4
• Thin film etching of TiO2, Al2O3and HFO2in HF mixture

Etching of metals:

• Etching of AL in HNO3and HP3O4 mixture
• Etching in Ni in HNO3

Surface Cleaning:

• Nanostrip is used to remove organic residues from sustrates.

NOTE: a separate safety training must be completed before using this fume hood.