Acid Fume Hood
MRL provides the following acids for cleanroom users. This fume hood includes DI water, nitrogen gun and hot plate.
- Hydrochloric Acid (HCl)Hydrofluoric Acid (HF)
- Buffered Oxide Etch (BOE)
- Nano-strip (replacment for piranha)
- Nitric Acid (HNO3)
- Phosphoric Acid (HP3O4)
Etching of dielectrics:
- Etching of SiO2in BOE or HF
- Etching of Si3N4in HP3O4
- Thin film etching of TiO2, Al2O3and HFO2in HF mixture
Etching of metals:
- Etching of AL in HNO3and HP3O4 mixture
- Etching in Ni in HNO3
- Nanostrip is used to remove organic residues from sustrates.
NOTE: a separate safety training must be completed before using this fume hood.