Mask Fabrication Services
Thank you very much for being a valuable customer of our mask fabrication services here in the Materials Research Laboratory at the University of Illinois at Urbana-Champaign. Effective September 1st, 2021 we no longer offer this service.
Most of our customers have or are in the process of moving to maskless processes for device fabrication with no need for photomasks. Over the past year we have added a Heidelberg MLA150 maskless writer to our cleanroom/fab core of shared instrumentation and we would like to encourage you to consider using that tool for your lithography needs. The maskless process offers a non-contact, economic and very high speed compared to mask-based processes. For instance, full areas of 200 mm x 200 mm with features down to 1 micron can be exposed in only 36 minutes. Details on that instrument and capability can be found here: https://mrl.illinois.edu/facilities/equipment/heidelberg-mla150-aligner-maskless-photolithography
In order to become a user of our maskless writer – or any other equipment or facilities in our cleanroom in the MRL shared instrumentation – please contact us or visit the web site: https://mrl.illinois.edu/facilities/become-user
The MRL shared facilities are available to users on 24/7 basis, with training of users or staff-assisted work in the facilities available during regular business hours.
Please do not hesitate to contact us if you have any questions.