Nordson March Reactive Ion Etch (RIE) Plasma System 1 & 2

March CS-1701 reactive ion etcher is a bench-top system with water cooled RF platen. It is capable of etching photoresist, polymer and graphene.

This system could be operated under manual mode or auto mode.


march RIE
march RIE



  • 400W, 13.56 MHz RF Generator with Automatic Matching Network
  • Delivers Excellent Process Repeatability.
  • Two MFC gas flow channels: O2 and CF4.
  • The March RIE 1/2 chamber is configured with a 7”/5” powered electrode to accommodate a wide range of wafer sizes.

Special Notes and Restrictions:

  • You must be qualified by staff to use this tool.
  • This tool is reserved for the following materials:photoresist, polymer and graphene.Etching of materials other than these requires prior authorization from staff.
  • When you are done with your work, always leave the chamber under vacuum. And never leave a dirty chamber for the next user.


Manufacturer's website:


Senior Research Engineer
Research Scientist