Nordson March Reactive Ion Etch (RIE) Plasma System 1 & 2

March CS-1701 reactive ion etcher is a bench-top system with water cooled RF platen. It is capable of etching photoresist, polymer and graphene.

This system could be operated under manual mode or auto mode.

Features:

• 400W, 13.56 MHz RF Generator with Automatic Matching Network
• Delivers Excellent Process Repeatability.
• Two MFC gas flow channels: O₂ and CF₄.
• The March RIE 1/2 chamber is configured with a 7”/5” powered electrode to accommodate a wide range of wafer sizes.

Special Notes and Restrictions:

• You must be qualified by staff to use this tool.
• This tool is reserved for the following materials:photoresist, polymer and graphene.Etching of materials other than these requires prior authorization from staff.
• When you are done with your work, always leave the chamber under vacuum. And never leave a dirty chamber for the next user.

Resources

Manufacturer's website: 
http://www.nordson.com/en/divisions/march/products/plasma-treatment-systems/rie-system