Micro/Nanofabrication Instruments

The Micro/Nanofabrication Facility offers:

Clean Room

The class-1000 clean room is more than 1,400-square feet and is housed on the third floor of the MRL. The clean room provides chemicals and equipment for doing lithography and wet chemistry processes for micro structures as well as multi-layer devices.

Deposition Tools

  • Savannah S100 Atomic layer deposition (Cambridge Nanotech, quantity 2)
  • Thermal Evaporation (with Ion Milling capability, Common Wealth Scientific)
  • Thermal Evaporation (Kurt J. Lesker Nano 36)
  • Plasma Enhanced Chemical Vapor Deposition (PE-CVD, PlasmaTherm/Unaxis SLR730)
  • ATC 2000 custom four gun Co-sputtering system (AJA International)
  • Orion-8 Magnetron Sputtering System (7 targets, AJA International)
  • Temescal six pocket E-Beam Evaporation Systems (quantity 3: Ebeam 1, 2 and 4)
  • Temescal four pocket E-Beam Evaporation Systems (quantity 1: Ebeam 3)

Maximum deposition thickness for all E-beam systems is 300 nm. In Ebeam 3, special depositions with film thickness > 300 nm and < 1 µm may be allowed only when approved by Staff. There might be an additional surcharge in these cases.

Dry Etching Tools

  • Reactive Ion Etch (Plasma Therm)
  • Reactive Ion Etch (Nano-master)
  • Reactive Ion Etch (March)
  • O2 Plasma Etch/Asher (LFE)
  • Ion Milling system (Integrated with Thermal Evaporation in one system)

Lithograhy Tools

  • Spin Coater Systems (Headway Research): quantity 2; (Specialty Coatings): quantity 1
  • MJB3 Mask Aligner (Suss Microtech): quantity 3
  • MJB3 Stamper Tool( Suss Microtech): quantity 1
  • MJB4 Mask Aligner (Suss Microtech): quantity 1
  • Yield Engineering  HMDS Vapor Prime Oven: quantity 1
  • Yield Engineering P-I Curing Ovens: quantity 2
  • UV 365 nm Exposure System (Oriel)
  • Nano engineering workstation (eLine RAITH)

Diffusion/Annealing Furnaces

  • 6" Tube oxidation furnace
  • 2" Tube oxidation/annealing furnace
  • High Temperature CM furnace
  • Rapid Thermal Annealing furnace (Custom)
  • Box furnace
  • Vacuum furnace
  • CVD Graphene/Carbon nanotube growth furnace

Bonding Stations

  • Ball Bonder (25 um Gold wire, K&S 4524A)
  • Wedge Bonder (25 um Aluminum wire, K&S 4523A)

Probe Stations

  • Temperature Controlled Cryogenic Vacuum Probe Station (77K to 475K, Lake Shore, Model: FWPX)
  • Bench Top Probe Station (Custom)
  • 4155c Semiconductor Parameter Analyzer (Agilent), used with Lake Shore and custom probe station

Other Resources

  • Optical Microscopes with CCD cameras
  • Jandel 4-point probe sheet resistance measurement

Contact microfabstaff@mrl.illinois.edu for training or other inquiries.