AJA Orion-8 Sputtering System for Magnetic Materials

Equipment Location: 
336 MRL

This equipment was funded through the Illinois MRSEC, NSF Award Number DMR-1720633.

 

Features:

  • UHV system
  • 8 targets
  • Off-axis deposition option
  • DC and RF generators
  • Full automation for deposition control
  • +/- 2.5% thickness uniformity over 4” wafer
  • Substrate temperature up to 850oC
  • +/- 0.1oC substrate temperature stability