4th Advanced Materials Characterization Workshop 2010
Date: June 9 and 10, 2010
Venue: Engineering Sciences Building, Room 190
1101 West Springfield Avenue, Urbana, IL 61801
The workshop will provide a critical, comparative, and condensed overview of mainstream analytical techniques for materials characterization with emphasis on practical applications. The workshop will cover the following techniques:
- atomic force microscopy (AFM)
- x-ray diffraction, reflectivity and fluorescence (XRD, XRR, XRF)
- scanning and transmission electron microscopy (SEM, TEM, STEM)
- focused ion beam (FIB)
- Auger electron spectroscopy (AES)
- x-ray photoelectron spectroscopy (XPS)
- secondary ion mass spectrometry (SIMS)
- Rutherford backscattering (RBS)
- optical spectroscopy (Raman, Photoluminescence, FTIR, ellipsometry), etc.
The lectures will be presented by scientists with extensive experience in each technique. The following topics will be covered:
- A short review of the fundamentals of each analytical technique.
- Critical review of strengths and weaknesses of each technique: how to combine techniques to extract the best possible complementary information.
- Comparative review of the instrumentation options with emphasis on differences in resolution, sensitivity, detection limits, sample requirements.
- Data acquisition strategies and data processing methods.
- Expert tips on how to avoid measurement artifacts.
- Detailed discussion of practical examples including industrial applications in areas such as nanotechnology, microelectronics, thin films, coatings, bioengineering, mineralogy, medical, and pharmaceutical research.
The workshop will also include a vendor show. Product specialists will be present to showcase their products and to discuss applications and technologies.
Laboratory tours showing the main instruments available at the CMM will be given during the workshop.
Registration is required. Register soon - space is limited.
Julie ten Have (217) 333 1371;
Mauro Sardela (217) 244 0547.