AMC 2007

Advanced Materials Characterization Workshop

Advanced Materials Characterization Workshop
Advanced Materials Characterization Workshop

As part of its outreach activities, the Center for Microanalysis of Materials and Frederick Seitz Materials Research Laboratory has hosted and will continue to host, a variety of National/Regional conferences with topics of interest to the materials research community. Past conferences have had a strong emphasisis on the characterization of materials at the nanoscale.

 

May 23, 2007

An introduction to the advanced materials characterization techniques available at the CMM was presented in eight tutorial lectures in a one day workshop with a strong focus on practical applications and problem solving strategies. The tutorials covered techniques such as atomic force microscopy (AFM), x-ray diffraction and reflectivity (XRD, XRR), scanning electron microscopy (SEM), Auger electron spectroscopy (AES), x-ray photoelectron spectroscopy (XPS), transmission electron microscopy (TEM), secondary ion mass spectrometry (SIMS), Rutherford backscattering (RBS), near field microscopy and optical spectroscopy. The lectures were be given by FS-MRL facility scientists with 10+ years of hands-on experience in each particular technique and covered:

  • The fundamentals of each analytical technique.
  • Comparative review of the instrumentation available for each technique with emphasis on differences in resolution, sensitivity, sample requirements, etc.
  • Data acquisition strategies, data interpretation, and quantification methods.
  • Expert tips on how to avoid measurement artifacts.
  • Typical examples of data acquired in CMM.
  • Discussion of strengths and weaknesses of each technique and how to combine techniques to extract the best possible complementary information.