Advanced Materials Characterization Workshop 2015

AMC 2015 provided a critical, comparative and condensed overview of major analytical techniques for materials characterization with emphasis on practical applications. Lectures covered basic and advanced topics geared towards both novice and experienced scientists.

Sessions focused on problem solving strategies, resolution requirements and potential artifacts in data collection and analysis. Several walkthrough examples from various fields were demonstrated.

AMC 2015 was held JUNE 2 & 3, 2015
at the Frederick Seitz Materials Research Laboratory
University of Illinois at Urbana-Champaign

Topics included:

  • Atomic force microscopy (AFM).
  • Optical spectroscopy (Raman, FTIR, ellipsometry, etc.) and microscopy (confocal, near-field scanning).
  • Surface analysis: Auger electron spectroscopy, secondary ion mass spectrometry (SIMS), x-ray photoelectron spectroscopy (XPS), Rutherford backscattering (RBS).
  • Scanning and transmission electron microscopy (SEM, TEM, STEM).
  • X-ray diffraction (XRD), reflectivity (XRR), micro-XRD and small-angle x-ray scatterings (SAXS).
  • Special session on sample preparation and analysis of biological materials.

Presenters:

  • MRL staff scientists with 20+ years of hands-on experience in materials characterization.
  • Industrial scientists introducing new technology and metrology.

Special events:

  • Vendors exhibit show with live instrument demos and on-site industrial scientists discussing new applications and providing expert answers to your questions.
  • Several networking events including evening reception, breaks and lunches.

REGISTRATION IS CLOSED

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